With a total investment of RMB 834 million, Phase II of the Optoelectronic Information Industrial Park in the Economic and Technological Development Zone covers an area of 21,000 m2 and a total construction area of 114,000 m2. The project mainly consists of two 21-story industrial incubation buildings. Additionally, there will be supporting projects including roads, greening, walls, gates, power supply, water supply and drainage, and heating systems. In May, the interior decoration will be completed. In June, road lighting, greening and hardening will be carried out. It is expected that Phase II of the Park will be completed and put into use by the end of June.

 

Phase II of the Park is one of the key pivots for the development of the optoelectronic information industry in the Zone. It is primarily responsible for the development of the CMOS image sensor industry cluster and the incubation of optoelectronic information industry projects that have been put into production. Located near the industrial concentration area, high-quality living area and important business district in the Zone, the project enjoys an excellent geographical location and complete urban supporting facilities. Upon completion, it will facilitate the concentrated growth of the optoelectronic information industry in the Zone, thus forming an industrial development cluster.